native oxide meaning in Chinese
自然氧化层
Examples
- Native oxide layer
自然氧化膜 - It is the only one compound semiconductor whose native oxide is sio2 . therefore , the sic devices can be manufactured using the technology of the silicon processing , for example mos devices
Sic是唯一可以氧化生长成sio _ 2的化合物半导体材料，这使得它可以运用si平面工艺条件进行sic器件的制造，特别制作mos器件方面。 - 4 the cleanout and the passivation of si surface was carried out by a two - step process to overcome the surface oxide layer and balance the charge between the substrate and epitaxy . by this way , the crystal quality and emission characteristic of zno thin films can be improved , which provide a way to resolve the native oxide layer of si substrate
4 、通过用等离子体对硅衬底表面进行清洗和钝化两步处理，解决硅衬底表面的氧化层和界面电荷平衡问题，制备出了高质量的氧化锌薄膜材料，找到了一条获得了高质量的氧化锌薄膜的新途径。 - In order to otain high quality zno thin films , we , for the first time , employ the plasma enhanced chemical vapor deposition ( pecvd ) to prepare high quality zno thin film at low temperature using a zinc organic source ( zn ( c2h5 ) 2 ) and carbon dioxide ( co2 ) gas mixtures . the effects of the growing condiction and the native oxide layer of si substrate on the quality of zno thin films was studied in detail . to prepare p - zno and overcome the dufficulty of reverse due to the interaction between the n atomic , we obtain high qulaity p - zno by a easy way of thermal zn3n2
为了在低温下制备高质量的氧化锌薄膜，我们采用金属有机源和二氧化碳气源，首次利用等离子体增强化学气相沉积的技术在低温下制备了高质量的氧化锌薄膜，系统地研究了生长条件以及衬底表面氧化层对薄膜质量的影响，确定了生长高质量氧化锌薄膜的优化条件；为获得p - zno材料，克服在zno中掺n杂质间相互作用影响掺杂效率不易获得p - zno的困难，我们通过热氧化zn3n2的方法制备了p - zno ，获得了一系列研究结果： 1 、详细研究了气体流速比，衬底温度和射频功率实验参数对氧化锌薄膜特性的影响。